• DocumentCode
    3503395
  • Title

    Reduction of nitrogen oxide using ammonia radicals prepared by intermittent dielectric barrier discharge

  • Author

    Kawamura, K. ; Yukimura, K. ; Kambara, S. ; Moritomi, H. ; Yamashita, T.

  • Author_Institution
    Dept. of Electr. Eng., Doshisha Univ., Kyoto, Japan
  • fYear
    2004
  • fDate
    1-1 July 2004
  • Firstpage
    211
  • Abstract
    Summary form only given. Non-thermal plasma processes have attracted attention to de-NOx because of their high removal efficiency and cost effective process, where the plasma-induced radicals efficiently convert NOx into harmless gases such as N/sub 2/, O/sub 2/, and H/sub 2/O and useful matters. In the present study, a method of radical injection was used, where the ammonia radicals were externally generated by a dielectric barrier discharge (DBD) in a separate chamber of a small volume, and were injected into NOx gas stream field to reduce NOx molecules. NO in N/sub 2/ gas was reduced by the ammonia radicals. The plasma is generated at a gap with a coaxial electrode configuration using one-cycle sinusoidal (OCS)-wave power source to accomplish high removal and energy efficiencies. The repetition rate of plasma generation was 5-50 kHz and the output peak-to peak voltage of the power supply was 2-20 kV. The dependence on the discharge power was measured by varying the repetition rate and applied voltage. The maximum energy efficiency, 140 g/kWh, was obtained at small values of the NH/sub 3/ concentration and the discharge power. It was found that the both NO removal rate and energy efficiency were correlated by the product of excited power per unit volume and ammonia residence time in the plasma reactor. Experiments were also made to obtain higher energy efficiency for various gap lengths of DBD source on optimal gas flow rate and applied voltage for de-NOx.
  • Keywords
    discharges (electric); nitrogen compounds; plasma applications; plasma chemistry; reduction (chemical); 2 to 20 kV; 5 to 50 kHz; NO; NOx gas; ammonia radicals; gas flow; harmless gases; intermittent dielectric barrier discharge source; nitrogen oxide; nonthermal plasma processes; one-cycle sinusoidal wave power source; plasma generation; plasma reactor; plasma-induced radicals; radical injection; Costs; Dielectrics; Energy efficiency; Fault location; Gases; Nitrogen; Plasma measurements; Plasma sources; Power generation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
  • Conference_Location
    Baltimore, MD, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-8334-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.2004.1339803
  • Filename
    1339803