DocumentCode
3503534
Title
Field emission characteristics of graphene film on nickel substrate
Author
Zhang, Yu ; Zhou, Qionghui ; Deng, S.Z. ; Chen, Jun ; Xu, N.S.
Author_Institution
Sch. of Phys. & Eng., SunYat-Sen Univ., Guangzhou, China
fYear
2012
fDate
9-13 July 2012
Firstpage
1
Lastpage
2
Abstract
Graphene film on nickel substrate is synthesized by using thermal chemical vapor deposition method. The field emission characteristics of the graphene film are measured. The turn-on field of 6.4 V/μm and the emission current as large as 1.5 mA is achieved. The current stability of graphene film is very good with fluctuation less than 2.4%. The emission site is found from the protrusion of the graphene on the surface.
Keywords
chemical vapour deposition; field emission; graphene; thin films; C; Ni; emission current; field emission characteristic; graphene film measurement; graphene film stability; graphene surface protrusion; thermal chemical vapor deposition method; Films; Nickel; Substrates; Surface morphology; Thermal stability; field emission; graphene;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location
Jeju
ISSN
pending
Print_ISBN
978-1-4673-1983-6
Electronic_ISBN
pending
Type
conf
DOI
10.1109/IVNC.2012.6316849
Filename
6316849
Link To Document