DocumentCode :
3503534
Title :
Field emission characteristics of graphene film on nickel substrate
Author :
Zhang, Yu ; Zhou, Qionghui ; Deng, S.Z. ; Chen, Jun ; Xu, N.S.
Author_Institution :
Sch. of Phys. & Eng., SunYat-Sen Univ., Guangzhou, China
fYear :
2012
fDate :
9-13 July 2012
Firstpage :
1
Lastpage :
2
Abstract :
Graphene film on nickel substrate is synthesized by using thermal chemical vapor deposition method. The field emission characteristics of the graphene film are measured. The turn-on field of 6.4 V/μm and the emission current as large as 1.5 mA is achieved. The current stability of graphene film is very good with fluctuation less than 2.4%. The emission site is found from the protrusion of the graphene on the surface.
Keywords :
chemical vapour deposition; field emission; graphene; thin films; C; Ni; emission current; field emission characteristic; graphene film measurement; graphene film stability; graphene surface protrusion; thermal chemical vapor deposition method; Films; Nickel; Substrates; Surface morphology; Thermal stability; field emission; graphene;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
ISSN :
pending
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
Type :
conf
DOI :
10.1109/IVNC.2012.6316849
Filename :
6316849
Link To Document :
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