Title :
RuO2 doped SnO2 thin film on tungsten tip and its field emission
Author :
Bhise, A.B. ; More, M.A. ; Joag, D.S.
Author_Institution :
C. T. Bora Coll. Shirur, Pune, India
Abstract :
Nanocrystalline RuO2 doped SnO2 thin film has been synthesized by thermal evaporation on tungsten tip. The surface morphology of the as deposited thin film on tungsten tip has been characterized by SEM. The SEM studies reveal the complete required to draw an emission current of 1nA was observed to be 2 kV. An emission current density of the order of 8.9 A/cm2 has been obtained at an applied voltage of 7.5 kV. The Fowler-Nordheim plot show linear nature typically that of metal. The field enhancement factor estimated from the slope of F-N plot is 11260 cm-1, indicating that the electron emission from nanometric features of the emitter. The current stability recorded at preset value of 1 A/cm2 is observed to be promising with fluctuations less than 5 % of the stabilized current value. Our results on field emission from RuO2:SnO2 thin film on tungsten tip indicates that, it is a potential candidate for field emission based flat panel display devices, cold cathode electron sources, and in large area electronics devices.
Keywords :
cathodes; current density; evaporation; field emission displays; flat panel displays; nanostructured materials; ruthenium compounds; scanning electron microscopy; semiconductor thin films; surface morphology; tin compounds; tungsten; F-N plot estimation; Fowler-Nordheim plot; SEM study; SnO2:RuO2; W; cold cathode electron sources; current 1 nA; current stability; emission current density; field emission based flat panel display devices; field enhancement factor; large area electronics devices; nanocrystalline thin film; surface morphology; thermal evaporation; tungsten tip; voltage 2 kV; voltage 7.5 kV; Cathodes; Current density; Materials; Tungsten; Wires; SnO2; field emission; noise;
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
DOI :
10.1109/IVNC.2012.6316888