• DocumentCode
    3504435
  • Title

    Generation of magnetically driven shunting arc discharge and amorphous carbon film preparation

  • Author

    Yukimura, K. ; Kumagai, Motohiro ; Takaki, K. ; Mukaigawa, S. ; Fujiwara, Toshihito

  • Author_Institution
    Dept. of Electr. Eng., Doshisha Univ., Kyoto, Japan
  • fYear
    2004
  • fDate
    1-1 July 2004
  • Firstpage
    236
  • Abstract
    Summary form only given. The shunting arc discharge is an alternating capacitor discharge through a rod of metal or semi-metal. An optimization of the discharge condition has realized the self-ignition of the arc discharge at a low input power to the rod, leading to a much longer lifetime of the rod compared with the conventional shunting arc and the peripheral arc. The shunting-arc-produced plasma mainly consists of metal or semi-metal ions, and it has also been demonstrated that the ions can be extracted from the plasma. Thus, the shunting arc can be used as pulsed ion sources of metal and semi-metal for plasma-based ion implantation and deposition (PBII&D). Amorphous carbon films were deposited at a deposition rate of approximately 1 nm/min using omnidirectional shunting arcs. In order to improve the deposition rate, the arc was driven towards the substrate using a Lorentz force arisen from the interaction between the self magnetic field and the arc current. The deposition rate was improved by a factor of approximately 100 compared with the omnidirectional case. The sinusoidal half-cycle current has a peak of 1500 A and a duration of 20 /spl mu/s at 20 /spl mu/F-capacitor charging voltage of 600 V. The driving speed of the magnetically driven speed is about 1.3 mm//spl mu/s. The arc characteristics are analyzed using the Lorentz force. From the equation of motion, the plasma density of the shunting arc is estimated to be an order of 10/sup 17/ m/sup -3/. In PBII&D experiment, the ions are extracted from the magnetically driven shunting arc discharge. In comparison with the ion current characteristics between magnetically driven and omnidirectional shunting arcs, dominant species for the carbon film deposition by magnetically driven shunting arc discharges, are carbon neutrals emitted from the carbon holders and electrodes during the plasma acceleration.
  • Keywords
    amorphous state; arcs (electric); carbon; plasma density; plasma deposition; plasma immersion ion implantation; thin films; 1500 A; 20 muF; 600 V; C; Lorentz force; alternating capacitor discharge; amorphous carbon film preparation; arc current; carbon holders; carbon neutrals; deposition rate; discharge condition optimization; electrodes; magnetically driven shunting arc discharge; metal rod; peripheral arc; plasma acceleration; plasma based deposition; plasma density; plasma-based ion implantation; pulsed ion sources; self ignition; self magnetic field; semimetal rod; shunting arc produced plasma; sinusoidal half cycle current; Amorphous magnetic materials; Amorphous materials; Arc discharges; Capacitors; Carbon dioxide; Ion sources; Lorentz covariance; Magnetic films; Plasma immersion ion implantation; Plasma sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
  • Conference_Location
    Baltimore, MD, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-8334-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.2004.1339853
  • Filename
    1339853