DocumentCode
3504614
Title
Structure change and field emission of carbon nanotubes treated by plasma
Author
Yu, SeGi ; Kim, Jin-Young ; So-Yeon
Author_Institution
Dept. of Phys., Hankuk Univ. of Foreign Studies, Yongin, South Korea
fYear
2012
fDate
9-13 July 2012
Firstpage
1
Lastpage
2
Abstract
We study the field emission properties of multiwalled carbon nanotubes (MWCNTs) grown by thermal chemical vapor deposition (TCVD) on silicon substrate before and after plasma treatment. Ar and O2 gas plasma were used, which was compared with non-treated MWCNTs. The O2 plasma treated MWCNTs exhibited the most excellent electron emission among two plasmas treatment. In addition, uniformity of electron emission for O2 plasma treatment was good and turn-on field was decreased. Thus, plasma treated CNT was considered as using field emitter.
Keywords
carbon nanotubes; electron field emission; plasma CVD; C; MWCNT; Si; TCVD; electron field emission property; field emitter; gas plasma; multiwalled carbon nanotubes; plasma treated CNT; plasma treatment; thermal chemical vapor deposition; turn-on field; carbon nanotube; field emission; plasma;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location
Jeju
ISSN
pending
Print_ISBN
978-1-4673-1983-6
Electronic_ISBN
pending
Type
conf
DOI
10.1109/IVNC.2012.6316898
Filename
6316898
Link To Document