Title :
Electronic breakdown process of plasma polymer films
Author :
Nakano, T. ; Fukuyama, M. ; Hayashi, H. ; Ishii, K. ; Ohki, Y.
Author_Institution :
Dept. of Electr. Eng., Waseda Univ., Tokyo, Japan
Abstract :
It has been suggested that when dielectric breakdown is caused by an electronic process, the scattering of electrons will increase the dielectric strength. To confirm this, polar groups were introduced into plasma-polymer films, assuming that the polar groups would act as scattering centers, and the dielectric strength was measured. It was found that when the breakdown process is electronic, the breakdown field increases due to the introduction of an appropriate number of electron scattering centers such as nitrogen and fluorine
Keywords :
electric breakdown of solids; electric strength; organic insulating materials; polymer films; polymerisation; breakdown field; dielectric breakdown; dielectric strength; electron scattering; electronic breakdown process; electronic process; ethylene film; plasma polymerisation; plasma-polymer films; polar groups; scattering centers; Atom optics; Breakdown voltage; Dielectric breakdown; Dielectric measurements; Electric breakdown; Extraterrestrial measurements; Plasma chemistry; Plasma measurements; Polymer films; Space vector pulse width modulation;
Conference_Titel :
Conduction and Breakdown in Solid Dielectrics, 1989., Proceedings of the 3rd International Conference on
Conference_Location :
Trondheim
DOI :
10.1109/ICSD.1989.69166
