DocumentCode :
3504775
Title :
A simple route to the fabrication of 3-D structure on nanofilm
Author :
Wang, Lanlan ; Liu, Hongzhong
Author_Institution :
State Key Lab. for Manuf. Syst. Eng., Xi´´an Jiaotong Univ., Xi´´an, China
fYear :
2012
fDate :
9-13 July 2012
Firstpage :
1
Lastpage :
4
Abstract :
A diversity surface energy inspired 3-D insulator/metal(IM) structures, which fabricated on a independent Au nanofilm (the menbrane thichness is 50nm and the size is 3 ×3 centimeters) composes of 5.625e7 units. The diameter and the thickness of every units are ~3um and 50nm respectively. In this report, the novel method for the fabrication of 3-D structures on the nanofilm, base on the high surface energy material removal of the underside of the hole and the good malleable material compensation the stress concenstration of the top surface. A low turn turn on voltage of 2V/μm is estimated for IM micro-structures.
Keywords :
crystal microstructure; electron field emission; insulating materials; nanofabrication; nanostructured materials; surface energy; 3D structure fabrication; IM microstructures; IM structures; diversity surface energy inspired 3D insulator-metal structures; field emission; high surface energy material removal; independent gold nanofilm; malleable material compensation; size 50 nm; stress concentration; top surface; Gold; Nanostructures; Silicon; Stress; Surface topography; Surface treatment; field emission; insulator/metal(IM) structures; nanofilm; stress concentration; surface energy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
ISSN :
pending
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
Type :
conf
DOI :
10.1109/IVNC.2012.6316906
Filename :
6316906
Link To Document :
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