• DocumentCode
    3504775
  • Title

    A simple route to the fabrication of 3-D structure on nanofilm

  • Author

    Wang, Lanlan ; Liu, Hongzhong

  • Author_Institution
    State Key Lab. for Manuf. Syst. Eng., Xi´´an Jiaotong Univ., Xi´´an, China
  • fYear
    2012
  • fDate
    9-13 July 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    A diversity surface energy inspired 3-D insulator/metal(IM) structures, which fabricated on a independent Au nanofilm (the menbrane thichness is 50nm and the size is 3 ×3 centimeters) composes of 5.625e7 units. The diameter and the thickness of every units are ~3um and 50nm respectively. In this report, the novel method for the fabrication of 3-D structures on the nanofilm, base on the high surface energy material removal of the underside of the hole and the good malleable material compensation the stress concenstration of the top surface. A low turn turn on voltage of 2V/μm is estimated for IM micro-structures.
  • Keywords
    crystal microstructure; electron field emission; insulating materials; nanofabrication; nanostructured materials; surface energy; 3D structure fabrication; IM microstructures; IM structures; diversity surface energy inspired 3D insulator-metal structures; field emission; high surface energy material removal; independent gold nanofilm; malleable material compensation; size 50 nm; stress concentration; top surface; Gold; Nanostructures; Silicon; Stress; Surface topography; Surface treatment; field emission; insulator/metal(IM) structures; nanofilm; stress concentration; surface energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
  • Conference_Location
    Jeju
  • ISSN
    pending
  • Print_ISBN
    978-1-4673-1983-6
  • Electronic_ISBN
    pending
  • Type

    conf

  • DOI
    10.1109/IVNC.2012.6316906
  • Filename
    6316906