DocumentCode
3504775
Title
A simple route to the fabrication of 3-D structure on nanofilm
Author
Wang, Lanlan ; Liu, Hongzhong
Author_Institution
State Key Lab. for Manuf. Syst. Eng., Xi´´an Jiaotong Univ., Xi´´an, China
fYear
2012
fDate
9-13 July 2012
Firstpage
1
Lastpage
4
Abstract
A diversity surface energy inspired 3-D insulator/metal(IM) structures, which fabricated on a independent Au nanofilm (the menbrane thichness is 50nm and the size is 3 ×3 centimeters) composes of 5.625e7 units. The diameter and the thickness of every units are ~3um and 50nm respectively. In this report, the novel method for the fabrication of 3-D structures on the nanofilm, base on the high surface energy material removal of the underside of the hole and the good malleable material compensation the stress concenstration of the top surface. A low turn turn on voltage of 2V/μm is estimated for IM micro-structures.
Keywords
crystal microstructure; electron field emission; insulating materials; nanofabrication; nanostructured materials; surface energy; 3D structure fabrication; IM microstructures; IM structures; diversity surface energy inspired 3D insulator-metal structures; field emission; high surface energy material removal; independent gold nanofilm; malleable material compensation; size 50 nm; stress concentration; top surface; Gold; Nanostructures; Silicon; Stress; Surface topography; Surface treatment; field emission; insulator/metal(IM) structures; nanofilm; stress concentration; surface energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location
Jeju
ISSN
pending
Print_ISBN
978-1-4673-1983-6
Electronic_ISBN
pending
Type
conf
DOI
10.1109/IVNC.2012.6316906
Filename
6316906
Link To Document