Title :
Stability measurement of neon ion beam current emitted from supertip gas field ion source
Author :
Suzuki, Yuya ; Asai, Tetsuya ; Nagai, Shuichi ; Kajiwara, Kagemasa ; Hata, Koji ; Kajiwara, Kagemasa ; Iwata, Takayoshi ; Hata, Koji
Author_Institution :
Grad. Sch. of Eng., Mie Univ., Tsu, Japan
Abstract :
So far, focused ion beam (FIB) has been contributed to the development of nanotechnology. However, liquid metal ion source (LMIS) equipped on commercial FIB systems has a serious problem which is the pollution of sample surfaces due to irradiated ion species. To develop the pollution-free and high-brightness ion source, we have focused on noble-gas field ion source (GFIS) and have developed the practical use of Ne- or Ar-GFIS. In this study, we report the stability of Ne ion current emitted from a supertip prepared by a modified field-induced oxygen etching.
Keywords :
argon; etching; field ion emission; focused ion beam technology; liquid metal ion sources; nanotechnology; neon; Ar; FIB systems; LMIS; Ne; focused ion beam; high-brightness ion source; irradiated ion species; liquid metal ion source; modified field-induced oxygen etching; nanotechnology; neon ion beam current measurement; noble-gas field ion source; pollution-free brightness ion source; sample surface pollution; stability measurement; supertip gas field ion source; Circuit stability; Current measurement; Etching; Ion beams; Ion sources; Pollution measurement; Temperature measurement; focused ion beam; gas field ion source; oxygen etching; supertip;
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
DOI :
10.1109/IVNC.2012.6316953
