• DocumentCode
    3505781
  • Title

    Nano-carbon field electron emission films synthesized by a confined-plasma chemical vapor deposition system

  • Author

    Jiang, N. ; Wang, H.-X. ; Sasaoka, H. ; Nishimura, K.

  • Author_Institution
    R&D Div., Kochi FEL Co. Ltd., Kochi, Japan
  • fYear
    2012
  • fDate
    9-13 July 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    In this study, we developed a novel plasma CVD system that can generate a uniform long confined plasma column which enables us to grow the thin films on entire surface (3600) of the long-wire or rod substrates. By means of this kind of confined plasma CVD (CPCVD), nano-carbon films have been successfully deposited on the 1000-mm-long metal wires. The as-deposited nano-carbon films present the efficient field electron emission properties.
  • Keywords
    carbon nanotubes; electron field emission; plasma CVD; thin films; C; CPCVD; as-deposited nanocarbon films; confined-plasma chemical vapor deposition system; field electron emission property; metal wires; nanocarbon field electron emission films; plasma CVD system; rod substrates; size 1000 mm; thin films; uniform long confined plasma column; Coils; Electrodes; Films; Iron; Plasmas; Substrates; Wires; CPCVD; field emission; nano-carbon; wire substrate;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
  • Conference_Location
    Jeju
  • ISSN
    pending
  • Print_ISBN
    978-1-4673-1983-6
  • Electronic_ISBN
    pending
  • Type

    conf

  • DOI
    10.1109/IVNC.2012.6316956
  • Filename
    6316956
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3505781