Title :
Nano-carbon field electron emission films synthesized by a confined-plasma chemical vapor deposition system
Author :
Jiang, N. ; Wang, H.-X. ; Sasaoka, H. ; Nishimura, K.
Author_Institution :
R&D Div., Kochi FEL Co. Ltd., Kochi, Japan
Abstract :
In this study, we developed a novel plasma CVD system that can generate a uniform long confined plasma column which enables us to grow the thin films on entire surface (3600) of the long-wire or rod substrates. By means of this kind of confined plasma CVD (CPCVD), nano-carbon films have been successfully deposited on the 1000-mm-long metal wires. The as-deposited nano-carbon films present the efficient field electron emission properties.
Keywords :
carbon nanotubes; electron field emission; plasma CVD; thin films; C; CPCVD; as-deposited nanocarbon films; confined-plasma chemical vapor deposition system; field electron emission property; metal wires; nanocarbon field electron emission films; plasma CVD system; rod substrates; size 1000 mm; thin films; uniform long confined plasma column; Coils; Electrodes; Films; Iron; Plasmas; Substrates; Wires; CPCVD; field emission; nano-carbon; wire substrate;
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
DOI :
10.1109/IVNC.2012.6316956
