DocumentCode :
3506140
Title :
Effect of control parameters for electron beam deposited platinum on PtIr5 coated-silicon surface
Author :
Kanth, Sanjeev Kumar ; Park, Byong Chon ; Woon, Song ; Kim, Ho Seob
Author_Institution :
Korea Res. Inst. of Stand. & Sci., Daejeon, South Korea
fYear :
2012
fDate :
9-13 July 2012
Firstpage :
1
Lastpage :
2
Abstract :
The dependence of the rate and final height of the electron beam deposited platinum on the control parameters were studied by varying electron probe current density (PCD), accelerating voltage and deposition time.
Keywords :
current density; electron beam deposition; electron probes; elemental semiconductors; platinum compounds; silicon; PCD; PtIr; Si; accelerating voltage; control parameter effect; deposition time; electron beam deposition; electron probe current density; Acceleration; Current density; Electron beams; Platinum; Probes; Substrates; Surface treatment; Deposition time; PCD; Platinum deposition;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
ISSN :
pending
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
Type :
conf
DOI :
10.1109/IVNC.2012.6316973
Filename :
6316973
Link To Document :
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