DocumentCode :
3506230
Title :
Field emission from copper micro-cones formed by ion bombardment of copper substrate using an oxide masking
Author :
Song, Xiaomeng ; Zhao, C.X. ; Wu, J.Q. ; Chen, Jun
Author_Institution :
State Key Lab. of Optoelectron. Mater. & Technol, Sun Yat-sen Univ., Guangzhou, China
fYear :
2012
fDate :
9-13 July 2012
Firstpage :
1
Lastpage :
2
Abstract :
Copper micro-cones are formed by using Ar ion beam bombardment of copper substrate using oxide masking. Threshold field of about 15.6 MV/m was obtained from samples prepared with 1hr bombardment. Maximum current density of 51 mA/cm2 was obtained under the electric field of 19.6 MV/m.
Keywords :
cathodes; copper; current density; electron field emission; Ar; Cu; cold cathode; copper microcones; copper substrate; current density; electric field; ion beam bombardment; oxide masking; time 1 hr; Argon; Conductivity; Copper; Educational institutions; Substrates; Temperature; Field emission; copper microcone; ion bombardment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
ISSN :
pending
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
Type :
conf
DOI :
10.1109/IVNC.2012.6316977
Filename :
6316977
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3506230
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