DocumentCode
3506856
Title
Optical properties and photosensitivity of vacuum synthesized Ge-doped sol-gel amorphous SiO2
Author
Agnello, S. ; Boscaino, R. ; La Mattina, F. ; Grandi, S. ; Magistris, A.
Author_Institution
Dept. of Phys. & Astron. Sci., Palermo Univ., Italy
fYear
2005
fDate
22-24 June 2005
Firstpage
422
Lastpage
426
Abstract
We report optical and electron paramagnetic resonance investigations of gamma ray irradiation effects in sol-gel Ge-doped amorphous SiO2. The studied materials have Ge-doping levels up to 104 molar part per million and were densified by two routes differing for the atmosphere: O2+N2 or vacuum. The obtained results evidence that irradiation affects matrix sites inducing paramagnetic defects. Furthermore, the comparison between the two densification procedures shows that vacuum atmosphere induces higher radiation sensitivity.
Keywords
amorphous state; densification; doping profiles; gamma-ray effects; germanium; paramagnetic resonance; photoluminescence; silicon compounds; sol-gel processing; vacuum techniques; Ge-doping levels; SiO2:Ge; densification; electron paramagnetic resonance; gamma ray irradiation effects; optical paramagnetic resonance; photosensitivity; sol-gel amorphous SiO2; vacuum synthesis; Amorphous materials; Atmosphere; Atom optics; Bleaching; Electrons; Optical materials; Optical sensors; Paramagnetic materials; Paramagnetic resonance; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Fibres and Optical Passive Components, 2005. Proceedings of 2005 IEEE/LEOS Workshop on
Print_ISBN
0-7803-8949-2
Type
conf
DOI
10.1109/WFOPC.2005.1462166
Filename
1462166
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