DocumentCode
3506962
Title
Cesium hydroxide (CsOH): a useful etchant for micromachining silicon
Author
Clark, L.D., Jr. ; Lund, J.L. ; Edell, D.J.
Author_Institution
MIT, Cambridge, MA, USA
fYear
1988
fDate
6-9 June 1988
Firstpage
5
Lastpage
8
Abstract
The CsOH-H/sub 2/O etchant system was studied over a range of concentrations (10%-76% by weight) and temperatures (25-90 degrees C). The etch rates of
Keywords
caesium compounds; elemental semiconductors; etching; masks; semiconductor technology; silicon; tantalum; 1000 A; 25 to 90 degC; 550 micron; CsOH-H/sub 2/O; Si; Si/sub 3/N/sub 4/; SiO/sub 2/; Ta; micromachining; neural signal transducer; Anisotropic magnetoresistance; Etching; Metallization; Micromachining; Propellants; Silicon compounds; Solids; Temperature distribution; Testing; Transducers;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensor and Actuator Workshop, 1988. Technical Digest., IEEE
Conference_Location
Hilton Head Island, SC, USA
Type
conf
DOI
10.1109/SOLSEN.1988.26419
Filename
26419
Link To Document