Title :
A comparative study of fluorinated amorphous carbon films synthesized by pulsed vacuum arc plasma deposition and by PECVD
Author :
Yao, Z.Q. ; Yang, P. ; Huang, N. ; Sun, H. ; Wang, J.
Author_Institution :
Lab. of Adv. Mater. Process., Southwest Jiaotong Univ., Chengdu, China
Abstract :
Summary form only given. Fluorinated amorphous carbon films have received a considerable amount of attention recently due to their chemical inertness, water-proofing, low surface energy, anti-adherence of bacteria and biocompatibility. To explore the application in biomedical devices like electrosurgical tools, fluorinated amorphous carbon films with different fluorine content were fabricated on a silicon wafer by pulsed vacuum arc plasma deposition and by PECVD. Film composition and structure were characterized by X-ray photoelectron spectroscopy (XPS) and Raman scattering spectroscopy (Raman). Surface morphology and roughness were analyzed by atomic force microscopy (AFM). Hardness and scratch resistance were measured by nano-indentation and nano-scratching, respectively. Water contact angles were measured by the sessile drop method.
Keywords :
Raman spectra; X-ray photoelectron spectra; amorphous state; atomic force microscopy; biomedical materials; carbon; contact angle; fluorine; hardness; indentation; micromechanics; plasma CVD; plasma CVD coatings; stoichiometry; surface morphology; surface roughness; AFM; C:F; PECVD; Raman scattering spectroscopy; X-ray photoelectron spectroscopy; XPS; atomic force microscopy; bacteria antiadherence; biocompatibility; biomedical devices; chemical inertness; contact angle; electrosurgical tools; film composition; film structure; fluorinated amorphous carbon films; fluorine content; hardness; nanoindentation; nanoscratch; pulsed vacuum arc plasma deposition; scratch resistance; sessile drop method; silicon wafer; surface energy; surface morphology; surface roughness; Amorphous materials; Atomic force microscopy; Plasma applications; Plasma chemistry; Plasma devices; Plasma measurements; Raman scattering; Spectroscopy; Surface morphology; Vacuum arcs;
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-8334-6
DOI :
10.1109/PLASMA.2004.1339977
