Study of optimized deposition of thin film in DC magnetron sputtering and measuring the surface conductivity by four point probe and Hall effect

Summary form only given. In our investigation thin films of copper and brass were prepared by DC magnetron sputtering and coated on flat glasses. The effect of the thickness of brass and copper on electrical and optical properties was studied. The result shows that the resistively of thin films is a function of applied voltage. Furthermore it shows that the decrease in resistively with increased thickness is due to an increase in carrier concentration with increased film thickness.