Title :
Thermal plasma processing of B/sub 4/C and Al-B/sub 4/C nanopowders
Author :
Thakkar, N.R. ; Reddy, R.G.
Author_Institution :
Dept. of Metall. & Mater. Eng., Alabama Univ., Tuscaloosa, AL, USA
Abstract :
Summary form only given. B/sub 4/C powders are produced commercially in EAF via gas phase reaction or carbothermic reduction. Milling and purification is a necessary step for powders produced by this method. Also, as these powders are difficult to sinter to full density, they need pressurized sintering techniques and dopants to reduce sintering temperatures. In this study, B/sub 4/C powders are synthesized using thermal plasma technology. A non-transferred arc DC thermal plasma reactor is used to produce fine ultrapure B/sub 4/C powders by reaction between B/sub 2/O/sub 3/ powder and CH/sub 4/ gas. Thermodynamic analysis for the reaction systems was carried out based on Gibbs energy minimization. The product powder was characterized using XRD and SEM. Effect of process variables such as boron oxide powder to methane gas ratio, boron oxide feed rate and input power on product recovery and quality were studied. Quantitative XRD analysis was done to calculate B/sub 4/C product yield. B/sub 2/O/sub 3/:CH/sub 4/ molar ratio of 2:7, low B/sub 2/O/sub 3/ feed rate and Higher powder yield better B/sub 4/C powder product.
Keywords :
X-ray diffraction; aluminium; boron compounds; chemical analysis; free energy; milling; nanocomposites; nanoparticles; nanotechnology; plasma materials processing; powder technology; reduction (chemical); scanning electron microscopy; sintering; Al-B/sub 4/C nanopowder; B/sub 4/C; B/sub 4/C nanopowder; B/sub 4/C-Al; Gibbs energy minimization; SEM; XRD; boron oxide powder; carbothermic reduction; gas phase reaction; methane gas ratio; milling; molar ratio; nontransferred arc dc thermal plasma reactor; pressurized sintering; product quality; product recovery; purification; quantitative analysis; thermal plasma processing; thermal plasma technology; thermodynamic analysis; Boron; Feeds; Milling; Plasma applications; Plasma density; Plasma materials processing; Plasma temperature; Powders; Purification; X-ray scattering;
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-8334-6
DOI :
10.1109/PLASMA.2004.1339984