Author_Institution :
Rohm & Haas Co., Spring House, PA, USA
Abstract :
Three-dimensional micrometer-scale structures can be prepared from an acid hardening photoresist by the use of a special photomask. Positive-mode structures have surface relief features while the negative mode produces tunnels, chambers, and cantilever beams. The resist chemistry and process are versatile and can be tailored to specific applications. Exploratory work in preparing microstructures is described and possible applications are proposed.<>
Keywords :
masks; photoresists; semiconductor technology; transducers; 3D micrometer scale structures; cantilever beams; chambers; photomask; photoresist; resist chemistry; surface relief features; tunnels; Chemistry; Floods; Image converters; Inhibitors; Microstructure; Radiation hardening; Resins; Resists; Springs; Thermal resistance;
Conference_Titel :
Solid-State Sensor and Actuator Workshop, 1988. Technical Digest., IEEE
Conference_Location :
Hilton Head Island, SC, USA
DOI :
10.1109/SOLSEN.1988.26421
