Novel design parameters of a integrated band-reject filter under varying resistive loading

Advances in fabrication technique and more importantly the concept of microminiaturization for realization of highly reliable components have created a need for extension and adaptation of network theory in order to characterize the integrated structures of distributed natures of their active and passive elements. The present study intends to focus on the analysis of the performance characteristics of a two-port four-terminal sub-network of a distributed R-C-KR microstructure under varying resistive loading. The structure is made up of two rectangular resistive films of per-unit-length (p.u.l) series impedance´s R=Ro exp (kx) and KR respectively and separated from each other by a dielectric film of p.u.l shunt capacitance C=Co exp (-kx). Here Ro and Co are resistive and capacitive constants respectively, k being the exponential taper constant and K is the ratio of the resistivity of one layer to that of another layer with l (shown by distance variable x) representing the length of the films. The circuit under study is found to have some vital design parameters, which were not reported earlier that could serve as guidelines for a system designer to obtain pre-assigned patterns of the performance characteristics of the microstructure. The inter relationship of different parameters with each other for comparative explanation to help designer to arrive at quick conclusions is presented. It is shown that the band-reject centre frequency u_∞ remains constant for a particular set of parameters for all values of resistive loading. The effect of positive and negative tapering on such a sub-network under a wide range of load fluctuations are reported important characteristics comparing the gradual changes in parametric values of uniform and non-uniform microstructures have also been included