Title :
Corona discharge under supercritical conditions
Author :
Lock, E. ; Saveliev, A. ; Kennedy, Louis
Author_Institution :
Dept. of Mech. Eng., Illinois Univ., Chicago, IL, USA
Abstract :
Summary form only given. Generation of non-thermal discharge in supercritical fluid environment is considered difficult due to high pressures and temperatures of the critical points of the fluids. This arises form Paschen´s law that suggests that increasing the process pressure leads to increase in the voltage required for plasma generation and, therefore, to enhanced operational cost. We have studied generation of corona discharge under supercritical fluid conditions near the critical point. The required voltage for this process is three times lower than the Paschen´s law prediction due to extensive cluster formation under the investigated conditions. However, there is a need of further investigation of the dependence of the breakdown voltage on the temperature and pressure of the supercritical fluid, so that this new process-generation of plasma under supercritical fluid conditions can be used for material science and pollutant removal applications. This promising new technology offers combination of the advantages of supercritical fluids as a unique reaction media due to its heterogeneous chemistry, enhanced heat and mass transfer with the benefits of the high energetic plasma state that is characterized with fast chemical reactions and high selectivity.
Keywords :
corona; discharges (electric); mass transfer; plasma chemistry; plasma pressure; plasma production; plasma temperature; Paschen law; breakdown voltage; chemical reaction; cluster formation; corona discharge; heterogeneous chemistry; high energetic plasma state; mass transfer; nonthermal discharge; plasma generation; supercritical fluid; supercritical fluid condition; Chemical technology; Corona; Costs; Nuclear and plasma sciences; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Temperature dependence; Voltage;
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-8334-6
DOI :
10.1109/PLASMA.2004.1340122