DocumentCode :
3510277
Title :
Effect of L-C syntony on micro-gap dielectric barrier discharge at ambient pressure
Author :
Zhitao Zhang ; Mindi Bai ; Xiyao Bai ; Bo Yang ; Yang Xu
Author_Institution :
Key Lab. of Strong Electr.-Field Ionization Discharge, Dalian Maritime Univ., China
fYear :
2004
fDate :
1-1 July 2004
Firstpage :
389
Abstract :
Summary form only given. Abnormal phenomena are found in some DBD systems in which the discharge performance declines with an increase of applied frequency. In this paper, discharge parameters of a micro-gap DBD are studied and the results are: (1) L-C syntonic phenomena are found in a micro-gap DBD at ambient pressure. The syntonic frequency rests with transformer leak inductance of the power supply and the equivalent capacitance of the dielectric layer, which is a key reason why abnormal phenomena occur in the DBD system. (2) The syntonic in the DBD system not only affects the discharge performance but also damages the transformer and dielectric layers further to cause instability of the discharge system. Therefore the discharge parameters should be optimized to avoid syntony damage. (3) L-C syntonic phenomena can be used in the micro-gap DBD system when the condition of the discharge performance or its stability are ensured. With the L-C syntonic, the DBD system is in a state of resistance, so that the coupling of applied voltage of power is directed to the discharge gap to decrease the output voltage of transformer. The equivalent resistance of the DBD plasma is measured using the resistance to diagnose the evolved processing of the micro-gap DBD using impedance spectroscopy.
Keywords :
discharges (electric); plasma instability; L-C syntony effect; ambient pressure; dielectric layer; discharge system instability; equivalent capacitance; equivalent resistance; impedance spectroscopy; microgap dielectric barrier discharge; syntonic frequency; transformer leak inductance; Capacitance; Dielectrics; Electrical resistance measurement; Frequency; Inductance; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma stability; Power supplies;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-8334-6
Type :
conf
DOI :
10.1109/PLASMA.2004.1340149
Filename :
1340149
Link To Document :
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