DocumentCode :
3510281
Title :
Mesa structure formation using potassium hydroxide and ethylene diamine based etchants
Author :
Chang, S.-C. ; Hicks, D.B.
Author_Institution :
General Motors Res. Lab., Warren, MI, USA
fYear :
1988
fDate :
6-9 June 1988
Firstpage :
102
Lastpage :
103
Abstract :
A comparative study was done between ethylene diamine-pyrocatechol (EDP) and potassium hydroxide (KOH) etching systems for micromachining mesas in
Keywords :
elemental semiconductors; etching; organic compounds; potassium compounds; semiconductor technology; silicon; KOH; Si; etchants; ethylene diamine-pyrocatechol; micromachining; relative etch rates; Etching; Laboratories; Micromachining; Micromotors; Semiconductor device modeling; Silicon compounds; Temperature; Water;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensor and Actuator Workshop, 1988. Technical Digest., IEEE
Conference_Location :
Hilton Head Island, SC, USA
Type :
conf
DOI :
10.1109/SOLSEN.1988.26446
Filename :
26446
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3510281
بازگشت