Title :
Excimer laser processing in nano-technology
Author_Institution :
Laser X Co. Ltd., Aichi, Japan
Abstract :
In the emerging field of microelectronics, microrobotics and nano-electromechanical systems (NEMS) it is often desirable to fabricate sub um order structure of solid surfaces in various materials. Recently with the established technique of laser in science and industry, its application have become diversified in the nano- and micro-processing areas. Excimer laser operating in the u.v. region have been employed in various domains covering different spectrum of industrial applications. In all these processes, due to the short pulse width and different scale length of the beam interaction time with the material, various physical phenomenon are encountered that ultimately affects the structure development of the end product. The present paper describes a systematic study of generating sub micron grating like structures and underlines the different aspect on the quality and limitations of the fabricated structure. It further elaborate a few of the basic processes and explore the possibilities of current and new application areas
Keywords :
diffraction gratings; excimer lasers; laser beam machining; micromachining; micromechanical devices; nanotechnology; UV; excimer laser; excimer laser processing; lithography; microelectronics; microprocessing; microrobotics; nanoelectromechanical systems; nanoprocessing; nanotechnology; physical phenomenon; solid surfaces; submicron grating; submicron order structure; two beam interferometry; Gas lasers; Gratings; Holographic optical components; Laser beams; Laser theory; Optical coupling; Optical films; Optical pulses; Space vector pulse width modulation; Ultrafast optics;
Conference_Titel :
Micromechatronics and Human Science, 1999. MHS '99. Proceedings of 1999 International Symposium on
Conference_Location :
Nagoya
Print_ISBN :
0-7803-5790-6
DOI :
10.1109/MHS.1999.820000