DocumentCode
351045
Title
Excimer laser processing in nano-technology
Author
Kathuria, Y.P.
Author_Institution
Laser X Co. Ltd., Aichi, Japan
fYear
1999
fDate
1999
Firstpage
169
Lastpage
172
Abstract
In the emerging field of microelectronics, microrobotics and nano-electromechanical systems (NEMS) it is often desirable to fabricate sub um order structure of solid surfaces in various materials. Recently with the established technique of laser in science and industry, its application have become diversified in the nano- and micro-processing areas. Excimer laser operating in the u.v. region have been employed in various domains covering different spectrum of industrial applications. In all these processes, due to the short pulse width and different scale length of the beam interaction time with the material, various physical phenomenon are encountered that ultimately affects the structure development of the end product. The present paper describes a systematic study of generating sub micron grating like structures and underlines the different aspect on the quality and limitations of the fabricated structure. It further elaborate a few of the basic processes and explore the possibilities of current and new application areas
Keywords
diffraction gratings; excimer lasers; laser beam machining; micromachining; micromechanical devices; nanotechnology; UV; excimer laser; excimer laser processing; lithography; microelectronics; microprocessing; microrobotics; nanoelectromechanical systems; nanoprocessing; nanotechnology; physical phenomenon; solid surfaces; submicron grating; submicron order structure; two beam interferometry; Gas lasers; Gratings; Holographic optical components; Laser beams; Laser theory; Optical coupling; Optical films; Optical pulses; Space vector pulse width modulation; Ultrafast optics;
fLanguage
English
Publisher
ieee
Conference_Titel
Micromechatronics and Human Science, 1999. MHS '99. Proceedings of 1999 International Symposium on
Conference_Location
Nagoya
Print_ISBN
0-7803-5790-6
Type
conf
DOI
10.1109/MHS.1999.820000
Filename
820000
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