DocumentCode
3510626
Title
Measurement of density and conductivity in DC plasma by RF probe in different conditions
Author
Bahadori, F. ; Ghoranneviss, M. ; Mahmoudzadeh, M.
Author_Institution
Plasma Phys. Res. Lab., Tehran, Iran
fYear
2004
fDate
1-1 July 2004
Firstpage
398
Abstract
Summary form only given. As we know, the type of plasma is very important to sputtering process. Therefore, in this paper we used the radiofrequency probe to measuring the conductivity of DC plasma in different conditions of experimental, magnetic field and pressure and changes of gases. Then we obtained the optimum conditions for deposition of thin films.
Keywords
density measurement; plasma density; plasma deposition; plasma probes; plasma transport processes; DC plasma; RF probe; conductivity measurement; density measurement; magnetic field; optimum conditions; radiofrequency probe; sputtering process; thin film deposition; Conductivity measurement; Density measurement; Gases; Magnetic field measurement; Plasma density; Plasma measurements; Pressure measurement; Probes; Radio frequency; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location
Baltimore, MD, USA
ISSN
0730-9244
Print_ISBN
0-7803-8334-6
Type
conf
DOI
10.1109/PLASMA.2004.1340167
Filename
1340167
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