DocumentCode :
3510781
Title :
Moving double probe measurements in copper arc plasma and derivation of plasma parameters
Author :
Danaraddi, S.C.
Author_Institution :
Dept. of Phys., Basaveshwar Sci. Coll., Karnataka, India
fYear :
2004
fDate :
1-1 July 2004
Firstpage :
402
Abstract :
Summary form only given. A moving single probe technique has a reference point since it is biased with reference to any one electrodes of the plasma producing system. However, in some situations such as RF discharges and ionospheric plasma, a reference point is not available to bias the moving single probe. Hence a single moving probe technique is not applicable in such situations and the moving double probe technique is found to be more appropriate. Each probe is biased with respect to the other in this technique. When the two probes in a vertical plane are biased with a potential and allowed to move through arc plasma, collect some charges depending on the magnitude of the biasing potential, geometry of the probes and the time of flight of the probes. Charge collected by the probe hence current flowing to the probe circuit is estimated. The electron temperature, ion density, floating potential and the thermal velocity of ions are estimated. In the present investigations the copper arc current is maintained constant and the arc gaps are varied. It is expected that the electron temperature, ion density and thermal velocity be expected to be the same for all these different arc gaps. The derived results are based on probe measurements supports that the plasma parameters do not depend upon the arc gap, but depends on the arc current.
Keywords :
arcs (electric); copper; electrodes; high-frequency discharges; ion density; plasma density; plasma probes; plasma sources; plasma temperature; Cu; RF discharges; arc current; arc gap; biasing potential; copper arc current; copper arc plasma; current flow; electrodes; electron temperature; floating potential; ion density; ionospheric plasma; moving double probe technique; plasma parameters; plasma producing system; probe circuit; thermal velocity; time of flight; Circuits; Copper; Electrodes; Electrons; Geometry; Plasma density; Plasma measurements; Plasma temperature; Probes; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-8334-6
Type :
conf
DOI :
10.1109/PLASMA.2004.1340176
Filename :
1340176
Link To Document :
بازگشت