DocumentCode :
3511708
Title :
Growth and patterning of aligned carbon nanotubes for applications to cold cathodes and vacuum electronics
Author :
Yonhua Tzeng ; Chao Liu ; Yu-Chun Chen
Author_Institution :
Dept. of Electr. & Comput. Eng., Auburn Univ., AL, USA
fYear :
2004
fDate :
1-1 July 2004
Firstpage :
422
Abstract :
Summary form only given. The extremely large aspect ratio and sharp tips of carbon nanotubes made them among the most promising nanostructures for low-voltage and low-field cold cathode applications. The physically and chemically stable, highly thermally and electrically conductive carbon nanotubes allow very high density of electron current to be emitted without damages to the carbon nanotubes. By properly designing and growing carbon nanotubes and integrating them with 2-D and/or 3-D structures, high performance cold cathodes can be fabricated and applied to various vacuum electronics and vacuum power transferring applications. Well aligned carbon nanotubes have been grown using thermal chemical vapour deposition techniques and patterned into micro-structures by means of photolithographic techniques that are commonly used for silicon integrated circuit fabrication. Electron field emission at an average applied electric field of one volt per micrometer has been achieved. High current density cold cathodes fabricated on micro-patterned substrates as well as 3-D structures were investigated. In this presentation, the growth process, properties of carbon nanotubes, and their applications as cold cathodes for vacuum electronics is discussed.
Keywords :
carbon nanotubes; chemical vapour deposition; cold-cathode tubes; current density; electron density; electron field emission; elemental semiconductors; monolithic integrated circuits; photolithography; silicon; vacuum microelectronics; C; Si; carbon nanotube growth; cold cathode; electrically conductive material; electron current density; electron field emission; nanostructured materials; photolithography; silicon integrated circuit fabrication; thermal chemical vapour deposition; thermally conductive material; vacuum electronics; vacuum power transferring application; Application software; Blades; Carbon dioxide; Carbon nanotubes; Cathodes; Chaos; Electron emission; Geometry; Plasma applications; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-8334-6
Type :
conf
DOI :
10.1109/PLASMA.2004.1340213
Filename :
1340213
Link To Document :
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