Title :
Layer transfer of crystalline Si thin film by metal-assisted chemical etching concerning different H2O2/HF ratios
Author :
Lin, Tzu-Ching ; Shiu, Shu-Chia ; Pun, Keng-Lam ; Syu, Hong-Jhang ; Lin, Ching-Fuh
Author_Institution :
Grad. Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
Thin-film crystalline photovoltaic (PV) cell is a trend for future PV with its potential to achieve low cost and high efficiency. Concerning material utilization efficiency, we propose a method with a fast manufacturing method of thin crystalline Si by chemical solution. To obtain the highest efficiency of material utilization, experiments with different H2O2/HF ratio are conducted, where related mechanisms are discussed. Moreover, large-area (87.7 mm2) thin film transferred to glass is demonstrated, and with embedded nanohole structure, lowest optical reflectance of 0.26% is measured. These characteristics show that the fabricated thin film has potential for large-area crystalline thin film PV.
Keywords :
elemental semiconductors; etching; glass structure; hydrogen compounds; nanofabrication; photovoltaic cells; semiconductor thin films; silicon; H2O2-HF; Si; chemical solution; crystalline Si thin film; embedded nanohole structure; glass; layer transfer; manufacturing method; material utilization; metal-assisted chemical etching; optical reflectance; thin-film crystalline photovoltaic cell; Etching; Glass; Hafnium; Reflectivity; Silicon; Substrates; crystalline materials; etching; nanostructured materials; optical reflection; photovoltaic cells; silicon; thin film devices;
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
Conference_Location :
Austin, TX
Print_ISBN :
978-1-4673-0064-3
DOI :
10.1109/PVSC.2012.6317633
