DocumentCode :
3513770
Title :
Optical characterization of structurally graded Si1−xGex:H thin films
Author :
Podraza, Nikolas J. ; John, David B Saint
Author_Institution :
Dept. of Phys. & Astron., Univ. of Toledo, Toledo, OH, USA
fYear :
2012
fDate :
3-8 June 2012
Abstract :
High efficiency thin film silicon solar cells consist of multiple junctions with hydrogenated amorphous silicon, silicon germanium alloys, and nanocrystalline silicon (nc-Si:H) absorbers. Uniformity over large areas is challenging for nc-Si:H and an accurate method of mapping material quality via a technique like ex situ spectroscopic ellipsometry (SE) is desirable. In situ, real time SE (RTSE) measurements during growth show material evolves from amorphous to nanocrystalline, which complicates the analysis of single SE measurements. Information from RTSE has been applied to develop procedures to accurately extract the thickness at which nanocrystallites initially appear and coalesce from single SE measurements.
Keywords :
Ge-Si alloys; ellipsometry; hydrogen; nanostructured materials; semiconductor thin films; solar cells; Si1-xGex:H; nanocrystallite; optical characterization; real time spectroscopic ellipsometry; single SE measurement; solar cell; structurally graded thin film; Analytical models; Films; Nanostructured materials; Rough surfaces; Sensitivity; Surface roughness; ellipsometry; metrology; photovoltaic cells; refractive index; silicon; silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
Conference_Location :
Austin, TX
ISSN :
0160-8371
Print_ISBN :
978-1-4673-0064-3
Type :
conf
DOI :
10.1109/PVSC.2012.6317635
Filename :
6317635
Link To Document :
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