DocumentCode
3513946
Title
Management method for LSI wafer fabrication facilities
Author
Tsuyama, Tsutomu ; Harada, Toshimasa ; Nakazato, Jun ; Kubouchi, Kouichi
Author_Institution
Hitachi Ltd., Yokohama, Japan
fYear
1989
fDate
24-26 Jan 1989
Firstpage
183
Lastpage
185
Abstract
A method is described for analyzing factors causing variations in manufacturing facilities in which monitored data that correlate with product quality are collected during routine operation. By using a method of accumulating deviations from the center value of the monitored data and quality data in time sequence, the fluctuation point can be detected, the correlation checked, and the cause of the variation discovered
Keywords
large scale integration; management; quality control; reliability; LSI wafer fabrication facilities; correlation; fluctuation point; management method; monitored data; product quality; quality data; routine operation; time sequence; variation; Control charts; Fabrication; Fluctuations; History; Laboratories; Large scale integration; Manufacturing industries; Monitoring; Production engineering; Production facilities;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability and Maintainability Symposium, 1989. Proceedings., Annual
Conference_Location
Atlanta, GA
Type
conf
DOI
10.1109/ARMS.1989.49597
Filename
49597
Link To Document