Title :
Management method for LSI wafer fabrication facilities
Author :
Tsuyama, Tsutomu ; Harada, Toshimasa ; Nakazato, Jun ; Kubouchi, Kouichi
Author_Institution :
Hitachi Ltd., Yokohama, Japan
Abstract :
A method is described for analyzing factors causing variations in manufacturing facilities in which monitored data that correlate with product quality are collected during routine operation. By using a method of accumulating deviations from the center value of the monitored data and quality data in time sequence, the fluctuation point can be detected, the correlation checked, and the cause of the variation discovered
Keywords :
large scale integration; management; quality control; reliability; LSI wafer fabrication facilities; correlation; fluctuation point; management method; monitored data; product quality; quality data; routine operation; time sequence; variation; Control charts; Fabrication; Fluctuations; History; Laboratories; Large scale integration; Manufacturing industries; Monitoring; Production engineering; Production facilities;
Conference_Titel :
Reliability and Maintainability Symposium, 1989. Proceedings., Annual
Conference_Location :
Atlanta, GA
DOI :
10.1109/ARMS.1989.49597
