• DocumentCode
    3514074
  • Title

    Rapid prototyping of integrated microfluidic devices for combined radiation detection and plasma separation

  • Author

    Convert, L. ; Aimez, V. ; Charette, P. ; Lecomte, R.

  • Author_Institution
    Center (CRN2), Univ. de Sherbrooke, Sherbrooke, QC
  • fYear
    2008
  • fDate
    15-15 Oct. 2008
  • Firstpage
    105
  • Lastpage
    108
  • Abstract
    A rapid prototyping method was developed to integrate a microfluidic plasma separation device over a Si based radiation detector. KMPR photoresist was used to produce high pressure resistant channels sealed by a glass cover. Two methods were investigated to make access holes in the cover: laser micromachining and a simplified glass wet etching process. The lab-on-chip concept where a plasma separation device is coupled to an embedded on-chip p-i-n photodiode used as a high sensitivity beta particle detector was investigated. A first detector prototype was fabricated and characterized. KMPR autofluorescence was investigated to optimize microfluidic function characterization with fluorescent beads.
  • Keywords
    beta-ray detection; etching; fluorescence; lab-on-a-chip; laser beam machining; microfluidics; micromachining; p-i-n photodiodes; photoresists; rapid prototyping (industrial); separation; silicon radiation detectors; autofluorescence; embedded on-chip p-i-n photodiode; fluorescent beads; glass wet etching process; high pressure resistant channels; integrated microfluidic devices; lab-on-chip concept; laser micromachining; photoresist; plasma separation; radiation detection; rapid prototyping method; silicon based radiation detector; Glass; Microfluidics; Micromachining; PIN photodiodes; Plasma applications; Plasma devices; Prototypes; Radiation detectors; Resists; Wet etching; KMPR photoresist; Microfluidic; glass etch; p-i-n photodiode; rapid prototyping;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems and Nanoelectronics Research Conference, 2008. MNRC 2008. 1st
  • Conference_Location
    Ottawa, Ont.
  • Print_ISBN
    978-1-4244-2920-2
  • Electronic_ISBN
    978-1-4244-2921-9
  • Type

    conf

  • DOI
    10.1109/MNRC.2008.4683389
  • Filename
    4683389