DocumentCode :
3514422
Title :
Eliminating the galvanic effect for microdevices fabricated with PolyMUMPs®
Author :
Syed, Abdullah ; Mu, Luye ; Shavezipur, Mohammad ; Nieva, Patricia
Author_Institution :
Mech. & Mechatron. Eng., Univ. of Waterloo, Waterloo, ON
fYear :
2008
fDate :
15-15 Oct. 2008
Firstpage :
197
Lastpage :
200
Abstract :
The galvanic effect may notably damage associated micro-electro-mechanical devices fabricated with processes involving electrochemical steps. This effect is commonly observed when a significant amount of gold is used to design MEMS devices that are fabricated using PolyMUMPsreg. To study and overcome the galvanic effect on these devices, three methods are proposed: (1) connecting the device to a poly0 ring; (2) increasing the device surface area and (3) grounding the device to the substrate. The three methods are compared for their effectiveness in preventing galvanic corrosion. It is observed that although all three methods can considerably restrain the galvanic effect, grounding the device to the substrate is the best solution.
Keywords :
micromechanical devices; PolyMUMP; galvanic effect elimination; micro-electro-mechanical device fabrication; Corrosion; Fabrication; Galvanizing; Gold; Grounding; Hafnium; Microelectromechanical devices; Micromechanical devices; Silicon; Wet etching; HF wet etch release; MEMS corrosion; Microdevices; PolyMUMPs®; electrochemical etching; galvanic effect;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems and Nanoelectronics Research Conference, 2008. MNRC 2008. 1st
Conference_Location :
Ottawa, Ont.
Print_ISBN :
978-1-4244-2920-2
Electronic_ISBN :
978-1-4244-2921-9
Type :
conf
DOI :
10.1109/MNRC.2008.4683412
Filename :
4683412
Link To Document :
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