DocumentCode :
3515230
Title :
Versatile low cost wafer level packaging enabled by powderblasting
Author :
Lee, Jeyull
Author_Institution :
Harwell Bus. Centre, Appl. Microengineering Ltd., Didcot
fYear :
2008
fDate :
1-4 Sept. 2008
Firstpage :
245
Lastpage :
252
Abstract :
A novel and highly cost-effective range of wafer level packaging schemes are presented for batch production across a heterogeneous spectrum of materials and applications. The enabling technology for these techniques is the development of accurate and repeatable wafer patterning processes using microabrasive powder blasting, supported by state of the art aligned wafer bonding technology. The combination of low-cost, material independent wafer-patterning, electroplating and aligned wafer bonding (eutectic, anodic, glass frit, and low temperature direct bonding) offers the benefits of wafer level packaging to low-volume, R&D, batch, and bridge-to- manufacture applications. Material and process flexibility enables implantable, CMOS, wafer- and chip-to-wafer packaging.
Keywords :
electroplating; flexible manufacturing systems; powder technology; wafer bonding; wafer level packaging; batch production; low cost wafer level packaging; powderblasting; wafer bonding technology; wafer patterning processes; CMOS process; CMOS technology; Costs; Glass manufacturing; Packaging; Powders; Production; Temperature; Wafer bonding; Wafer scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics System-Integration Technology Conference, 2008. ESTC 2008. 2nd
Conference_Location :
Greenwich
Print_ISBN :
978-1-4244-2813-7
Electronic_ISBN :
978-1-4244-2814-4
Type :
conf
DOI :
10.1109/ESTC.2008.4684357
Filename :
4684357
Link To Document :
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