One-step catalyst-assist formation of silicon nanohole arrays with omnidirectional antireflection properties

In this work, a simple method to fabricate a silicon nanohole (SiNH) arrays embedded with Ag nanoislands via catalytic etching process. The SiNH arrays exhibit very low reflectance (~0.1%) from range of wavelength 400 to 1100 nm irrespective of the angle of incidence. A strong light trapping effect between the nanostructures causes high absorption.