Title :
Towards high-efficiency GaAs thin-film solar cells grown via close space vapor transport from a solid source
Author :
Ritenour, Andrew J. ; Boettcher, Shannon W.
Author_Institution :
Dept. of Chem., Mater. Sci. Inst., Eugene, OR, USA
Abstract :
GaAs is an attractive photovoltaic material, but its widespread implementation is limited in part by the high cost of metal-organic chemical vapor deposition, which employs toxic and pyrophoric gas-phase precursors. We study close-space vapor transport, which uses solid GaAs as a source and water vapor as a transport agent as an alternative technique for depositing GaAs films. Epitaxial n-GaAs thin films were grown on n+-GaAs substrates while varying the water vapor concentration and the source/substrate temperatures. The photovoltaic properties of the films were evaluated using a non-aqueous photoelectrochemical test cell containing the ferrocene/ferrocenium redox couple. We found that a wide range of growth conditions were suitable for growing GaAs films with diffusion lengths over 1 μm and open circuit voltages similar to what has been observed for GaAs grown using metal-organic chemical vapor deposition (~ 820 mV).
Keywords :
III-V semiconductors; MOCVD; chemical interdiffusion; gallium arsenide; oxidation; photoelectrochemical cells; reduction (chemical); semiconductor growth; semiconductor thin films; solar cells; GaAs; GaAs substrates; GaAs thin-film solar cells; close space vapor transport; diffusion lengths; epitaxial n-GaAs thin films; ferrocene/ferrocenium redox couple; metal-organic chemical vapor deposition; nonaqueous photoelectrochemical test cell; photovoltaic material; photovoltaic properties; pyrophoric gas-phase precursors; solid source; source/substrate temperatures; toxic gas-phase precursors; water vapor concentration; Electrodes; Films; Gallium arsenide; Inductors; Substrates; Temperature measurement; Water; GaAs; close-source vapor transport; diffusion length measurements; photoelectrochemistry;
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
Conference_Location :
Austin, TX
Print_ISBN :
978-1-4673-0064-3
DOI :
10.1109/PVSC.2012.6317751