DocumentCode :
3516739
Title :
Optical encoder readhead chip
Author :
Carr, John ; Desmulliez, M. ; Weston, Nick ; McKendrick, David ; Cunningham, Graeme ; McFarland, Geoff ; Meredith, Wyn ; McKee, Andrew ; Langton, Conrad ; Eddie, Lain
Author_Institution :
Microsyst. Eng. Centre, Heriot-Watt Univ., Edinburgh
fYear :
2008
fDate :
1-4 Sept. 2008
Firstpage :
797
Lastpage :
802
Abstract :
Optical encoders are pervasive in almost all sectors of industry including metrology, motion systems, electronics, medical, scanning/ printing, scientific instruments, space applications and specialist machine tools. The precision of automated manufacture and assembly has been revolutionised by the adoption of optical diffractive measurement methods. Todaypsilas optical encoders comprise discrete components: light source(s), reference and analyser gratings, and a photodiode array to utilise diffractive optic methods to achieve high resolution. However the critical alignment requirements between the optical gratings and the photodiode array, the bulky nature of the encoder devices and subsequent packaging mean that optical encoders can be prohibitively expensive for many applications and unsuitable for others.We report here a novel high resolution optical encoder readhead chip, which will initially be employed with Renishaw high precision metrology systems. Microsystems manufacturing techniques have allowed us to monolithically integrate the traditional key components of the encoder onto a single compound semiconductor chip. Fabrication of the gratings at the wafer level, by standard photo-lithography, allows for the simultaneous alignment of many devices in a single process step. This development, coupled with a new photodiode configuration, not only facilitates increased performance but also significantly improves the alignment tolerances in both manufacture and set-up, simplifying thereby the installation process. Operating in photoconductive mode a National Research and Development Corporation type optical encoder readhead chip has been successfully demonstrated under test conditions on 20 mum, 8mum and 4mum pitch scale. DC to AC ratios of the order of 7:1, signal-to-noise ratios greater than 50:1 and Lissajous curves with maximum peak-to-peak voltages reaching the operating limits of the test set-up have been achieved. Various reference schemes with in-scale ref- - erence mark features have also been trialled.
Keywords :
diffraction gratings; encoding; integrated optics; integrated optoelectronics; light sources; optical arrays; optical fabrication; photodetectors; photodiodes; photolithography; DC to AC ratios; Lissajous curves; Renishaw high precision metrology systems; optical encoder; optical encoder readhead chip; optical gratings; photoconductivity; photodiode array; photolithography; signal-to-noise ratios; Aerospace industry; Biomedical optical imaging; Gratings; Metrology; Optical arrays; Optical devices; Optical diffraction; Photodiodes; Semiconductor device manufacture; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics System-Integration Technology Conference, 2008. ESTC 2008. 2nd
Conference_Location :
Greenwich
Print_ISBN :
978-1-4244-2813-7
Electronic_ISBN :
978-1-4244-2814-4
Type :
conf
DOI :
10.1109/ESTC.2008.4684453
Filename :
4684453
Link To Document :
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