Title :
Utilizing an integrated yield management system to improve the return on investment in IC manufacturing
Author :
Castrucci, Paul ; Dickerson, Gary ; Bakker, Dave
Author_Institution :
Paul Castrucci & Associates Inc., Boston, MA, USA
Abstract :
The authors describe how a yield management system (YMS) could be designed to provide tools to quickly find and fix process and equipment defect problems in 16 Mbit DRAM IC manufacturing. The proposed system design consists of the KLA 2110 wafer inspection system (with sensitivity down to 0.25 μm for 16 Mbit DRAM manufacturing), optical and SEM (scanning electron microscope) defect review stations, wafer prober stations, reticle inspectors, a dielectric failure detection system, a defect image storage unit, an analysis workstation, and a host computer where work-in-process and yield information is stored
Keywords :
CAD/CAM; DRAM chips; automatic optical inspection; integrated circuit manufacture; integrated circuit testing; manufacturing computer control; 0.25 micron; 16 Mbit; DRAM IC manufacturing; IC manufacturing; KLA 2110 wafer inspection system; SEM defect review; analysis workstation; defect image storage unit; dielectric failure detection system; host computer; integrated yield management system; optical defect review; reticle inspectors; return on investment; wafer prober stations; work-in-process; yield information; Computer aided manufacturing; Electron optics; Image storage; Inspection; Manufacturing processes; Optical microscopy; Optical sensors; Random access memory; Scanning electron microscopy; System analysis and design;
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1991. ISMSS 1991., IEEE/SEMI International
Conference_Location :
Burlingame, CA
Print_ISBN :
0-7803-0027-0
DOI :
10.1109/ISMSS.1991.146261
