Title :
Surface evolution and bonding properties of electroplated Au/Sn/Au
Author :
Wang, K. ; Aasmundtveit, K. ; Jakobsen, H.
Author_Institution :
Inst. for Microsyst. Technol., Vestfold Univ. Coll., Tonsberg
Abstract :
Sandwich-structural multilayer films Au (4.0 mum)/Sn (2.0 mum)/Au (x mum) with x = 0.1, 0.3 have been electroplated on metalized silicon wafers. Interdiffusion of thin film Au in metallic Sn at room temperature is observed by light microscope on fresh electroplated multilayer surface. For the multilayer films with Au thickness x = 0.1, 0.3 mum, the Sn surface concentration on surface are roughly increased from 0 to 20(at)% after 1 and 4 days aging, respectively. The sandwich structure is bonded to wafers with x mum layer of electroplated Au. The bonding experiments are performed at 280degC, in atmosphere without flux. Scanning Electron Microscope (SEM) cross-section images show the formation of gold-tin alloy in bonded region and shear testing results indicate that the bonding strength reaches more than 11 MPa.
Keywords :
ageing; chemical interdiffusion; electroplated coatings; gold; metallic thin films; multilayers; optical microscopy; sandwich structures; scanning electron microscopy; tin; SEM; Sn-Au; aging; bonding properties; bonding strength; electroplated multilayer surface; electroplating; gold-tin alloy; light microscopy; metalized silicon wafers; sandwich structure; sandwich-structural multilayer films; scanning electron microscopy; shear testing; surface concentration; temperature 280 degC; temperature 293 K to 298 K; thin film interdiffusion; Gold; Nonhomogeneous media; Rough surfaces; Scanning electron microscopy; Semiconductor films; Silicon; Surface roughness; Tin; Transistors; Wafer bonding;
Conference_Titel :
Electronics System-Integration Technology Conference, 2008. ESTC 2008. 2nd
Conference_Location :
Greenwich
Print_ISBN :
978-1-4244-2813-7
Electronic_ISBN :
978-1-4244-2814-4
DOI :
10.1109/ESTC.2008.4684511