DocumentCode :
3517944
Title :
Equipment start-up in a manufacturing environment
Author :
Vines, Landon ; Jhota, Ravl ; Cannizzaro, Stephen
Author_Institution :
VLSI Technol Inc., San Antonio, TX, USA
fYear :
1991
fDate :
20-22 May 1991
Firstpage :
55
Lastpage :
61
Abstract :
The authors present the methodology used to install and start up a new plasma etcher for production in a 1.0 micron/CMOS manufacturing line. It was demonstrated that a coordinated effort by equipment engineering, process engineering, technology development, equipment maintenance, and a vendor/partner can result in a quality-oriented start up. A specification was written to incorporate the procedures for installation, start up, equipment baselining, process characterization, and transfer to production on new equipment. It is noted that an ongoing relationship with a vendor/partner and all groups within the fabrication area will enable continuous improvement to the existing equipment and any new equipment being purchased
Keywords :
CMOS integrated circuits; integrated circuit manufacture; production control; sputter etching; 1 micron; CMOS manufacturing line; equipment baselining; equipment engineering; equipment maintenance; installation methodology; manufacturing environment; plasma etcher; process engineering; quality-oriented start up; technology development; transfer to production; Delay; Etching; Fabrication; Gases; Job shop scheduling; Manufacturing processes; Plasma applications; Production; Qualifications; Semiconductor device manufacture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1991. ISMSS 1991., IEEE/SEMI International
Conference_Location :
Burlingame, CA
Print_ISBN :
0-7803-0027-0
Type :
conf
DOI :
10.1109/ISMSS.1991.146266
Filename :
146266
Link To Document :
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