• DocumentCode
    3517960
  • Title

    Determination of grain boundary charging in Cu(In,Ga)Se2 thin films

  • Author

    Jiang, C.-S. ; Contreras, M.A. ; Repins, I. ; Moutinho, H.R. ; Noufi, R. ; Al-Jassim, M.M.

  • Author_Institution
    Nat. Renewable Energy Lab., Golden, CO, USA
  • fYear
    2012
  • fDate
    3-8 June 2012
  • Abstract
    Surface potential mapping of Cu(In,Ga)Se2 (CIGS) thin films using scanning Kelvin probe force microscopy (SKPFM) aims to understand the minority-carrier recombination at the grain boundaries (GBs) of this polycrystalline material by examining GB charging, which has resulted in a number of publications. However, the reported results are highly inconsistent. In this paper, we report on the potential mapping by measuring wide-bandgap or high-Ga-content films and by using a complementary atomic force microscopy-based electrical technique of scanning capacitance microscopy (SCM). The results demonstrate consistent, positively charged GBs on our high-quality films with minimal surface defects/charges. The potential image taken on a low-quality film with a 1.2-eV bandgap shows significantly degraded potential contrast on the GBs and degraded potential uniformity on grain surfaces, resulting from the surface defects/charges of the low-quality film. In contrast, the potential image on an improved high-quality film with the same wide bandgap shows significantly improved GB potential contrast and surface potential uniformity, indicating that the effect of surface defects is critical when examining GB charging using surface potential data. In addition, we discuss the effect of the SKPFM setup on the validity of potential measurement, to exclude possible artifacts due to improper SKPFM setups. The SKPFM results were corroborated by using SCM measurements on the films with a CdS buffer layer. The SCM image shows clear GB contrast, indicating different electrical impedance on the GB from the grain surface. Further, we found that the GB contrast disappeared when the CdS window layer was deposited after the CIGS film was exposed extensively to ambient, which was caused by the creation of CIGS surface defects by the ambient exposure.
  • Keywords
    atomic force microscopy; buffer layers; copper compounds; gallium compounds; grain boundaries; indium compounds; minority carriers; semiconductor thin films; surface potential; ternary semiconductors; CIGS thin films; CdS buffer layer; CuInGaSe2; complementary atomic force microscopy; electrical impedance; electron volt energy 1.2 eV; grain boundary charging; grain surfaces; high-Ga-content films; minority-carrier recombination; polycrystalline material; scanning Kelvin probe force microscopy; scanning capacitance microscopy; surface charges; surface defects; surface potential mapping; surface potential uniformity; wide-band gap films; Abstracts; Corrugated surfaces; Electric potential; Electric variables measurement; Fabrication; Microscopy; CIGS; grain boundary; scanning capacitance microscopy; surface potential scanning Kelvin probe force microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
  • Conference_Location
    Austin, TX
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4673-0064-3
  • Type

    conf

  • DOI
    10.1109/PVSC.2012.6317877
  • Filename
    6317877