DocumentCode
3518137
Title
Automated malfunction diagnosis of a plasma etcher
Author
May, Gary S. ; Spanos, Costas J.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fYear
1991
fDate
20-22 May 1991
Firstpage
62
Lastpage
68
Abstract
The authors present a prototype tool for real-time diagnosis of equipment malfunctions in IC fabrication processes. The approach taken focuses on integrating quantitative empirical models with qualitative knowledge-based methods. The diagnostic system uses evidential reasoning techniques to identify malfunctions by combining various sources of noisy information which originates chronologically from three primary sources: before processing (maintenance diagnosis), during processing (on-line diagnosis), and after processing (in-line diagnosis). The system has been implemented on the Lam Research Autoetch 490 automated plasma etcher located in the Berkeley Microfabrication Laboratory
Keywords
automatic testing; inference mechanisms; integrated circuit manufacture; production control; quality control; sputter etching; IC fabrication; Lam Research Autoetch 490 automated plasma etcher; automated malfunction diagnosis; equipment malfunctions; evidential reasoning techniques; in-line diagnosis; maintenance diagnosis; noisy information; on-line diagnosis; plasma etcher; qualitative knowledge-based methods; quantitative empirical models; real-time diagnosis; Circuit faults; Computer aided manufacturing; Diagnostic expert systems; Etching; Fabrication; Fault diagnosis; Manufacturing processes; Plasma applications; Plasma diagnostics; Plasma materials processing;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Science Symposium, 1991. ISMSS 1991., IEEE/SEMI International
Conference_Location
Burlingame, CA
Print_ISBN
0-7803-0027-0
Type
conf
DOI
10.1109/ISMSS.1991.146267
Filename
146267
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