• DocumentCode
    3518217
  • Title

    An SOI single-electron transistor

  • Author

    Xiaohui Tang ; Baie, X. ; Bayot, V. ; Van de Wiele, F. ; Colinge, J.P.

  • Author_Institution
    Microelectron. Lab., Katholieke Univ., Leuven, Belgium
  • fYear
    1999
  • fDate
    4-7 Oct. 1999
  • Firstpage
    46
  • Lastpage
    47
  • Abstract
    Single-electron transistors (SETs) are currently being investigated by many research groups as possible devices for ultra-high-density, low-power information processing or storage systems. A single-electron transistor consists of two tunnel junctions (TJ) connected to the source and the drain, a center floating node and a capacitance connected to the device gate. It takes a finite minimum source-to center node bias to inject an electron into the node by tunneling. This effect is called Coulomb blockade. In this paper, SET devices were fabricated using thin-silicon (100 nm) Unibond/sup (R)/ wafers and e-beam lithography, and were found to exhibit the Coulomb blockade effects predicted by theory.
  • Keywords
    Coulomb blockade; capacitance; electron beam lithography; semiconductor device measurement; silicon-on-insulator; single electron transistors; tunnelling; 100 nm; Coulomb blockade; Coulomb blockade effects; SETs; SOI single-electron transistor; Si-SiO/sub 2/; center floating node; device gate capacitance; drain; e-beam lithography; finite minimum source-to center node bias; low-power information processing; low-power storage systems; node electron injection; single-electron transistor; single-electron transistors; source; thin-silicon Unibond wafers; tunnel junctions; tunneling; ultra-high-density information processing systems; ultra-high-density storage systems; Capacitance; Energy states; Fabrication; Potential well; Silicon; Single electron transistors; Temperature measurement; Tunneling; Voltage; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 1999. Proceedings. 1999 IEEE International
  • Conference_Location
    Rohnert Park, CA, USA
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-5456-7
  • Type

    conf

  • DOI
    10.1109/SOI.1999.819851
  • Filename
    819851