DocumentCode
3518217
Title
An SOI single-electron transistor
Author
Xiaohui Tang ; Baie, X. ; Bayot, V. ; Van de Wiele, F. ; Colinge, J.P.
Author_Institution
Microelectron. Lab., Katholieke Univ., Leuven, Belgium
fYear
1999
fDate
4-7 Oct. 1999
Firstpage
46
Lastpage
47
Abstract
Single-electron transistors (SETs) are currently being investigated by many research groups as possible devices for ultra-high-density, low-power information processing or storage systems. A single-electron transistor consists of two tunnel junctions (TJ) connected to the source and the drain, a center floating node and a capacitance connected to the device gate. It takes a finite minimum source-to center node bias to inject an electron into the node by tunneling. This effect is called Coulomb blockade. In this paper, SET devices were fabricated using thin-silicon (100 nm) Unibond/sup (R)/ wafers and e-beam lithography, and were found to exhibit the Coulomb blockade effects predicted by theory.
Keywords
Coulomb blockade; capacitance; electron beam lithography; semiconductor device measurement; silicon-on-insulator; single electron transistors; tunnelling; 100 nm; Coulomb blockade; Coulomb blockade effects; SETs; SOI single-electron transistor; Si-SiO/sub 2/; center floating node; device gate capacitance; drain; e-beam lithography; finite minimum source-to center node bias; low-power information processing; low-power storage systems; node electron injection; single-electron transistor; single-electron transistors; source; thin-silicon Unibond wafers; tunnel junctions; tunneling; ultra-high-density information processing systems; ultra-high-density storage systems; Capacitance; Energy states; Fabrication; Potential well; Silicon; Single electron transistors; Temperature measurement; Tunneling; Voltage; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 1999. Proceedings. 1999 IEEE International
Conference_Location
Rohnert Park, CA, USA
ISSN
1078-621X
Print_ISBN
0-7803-5456-7
Type
conf
DOI
10.1109/SOI.1999.819851
Filename
819851
Link To Document