• DocumentCode
    3518320
  • Title

    2D silicon nanopillars arrays for photonics

  • Author

    Golobokova, Lyudmila S. ; Nastaushev, Yuri V. ; Dultsev, Fedor N. ; Kryzhanovskaya, Natalia V.

  • Author_Institution
    Rzhanov Inst. of Semicond. Phys., Novosibirsk, Russia
  • fYear
    2015
  • fDate
    June 29 2015-July 3 2015
  • Firstpage
    20
  • Lastpage
    23
  • Abstract
    In this paper, particularities of ordered silicon nanopillars (Si NP) arrays formation by mean electron beam lithography and dry etching were studied. The optical and electrical properties of the Si NPs were investigated.
  • Keywords
    electron beam lithography; elemental semiconductors; nanophotonics; nanostructured materials; silicon; sputter etching; 2D silicon nanopillars arrays; Si; dry etching; electrical properties; electron beam lithography; optical properties; ordered silicon nanopillars arrays; photonics; Etching; Image color analysis; Nanoscale devices; Optical imaging; Passivation; Silicon; electron beam lithography; nanophotonics; silicon nanopillars;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro/Nanotechnologies and Electron Devices (EDM), 2015 16th International Conference of Young Specialists on
  • Conference_Location
    Erlagol
  • ISSN
    2325-4173
  • Print_ISBN
    978-1-4673-6718-9
  • Type

    conf

  • DOI
    10.1109/EDM.2015.7184478
  • Filename
    7184478