DocumentCode :
3518359
Title :
Investigation of wire bonding power interconnection
Author :
Novotny, Marek ; Bursik, Martin ; Szendiuch, Ivan ; Hejatkova, Edita ; Jankovsky, Jaroslav
Author_Institution :
Dept. of Microelectron., Brno Univ. of Technol., Brno, Czech Republic
fYear :
2010
fDate :
12-16 May 2010
Firstpage :
166
Lastpage :
169
Abstract :
This paper deals with the investigation of wire bonding power interconnection for standard CMOS chips, which is very important for power application. Base part of this research is the determination of power load by the wire. For testing are design two types of substrate, especially the FR4 and ceramic substrate. As a conductive thick film layer on the ceramic substrate is used two different pastes. First paste was AgPd and the second one AgPdPt. Various wire interconnections are made on each substrate. This contact are analyzing in term of power load. The evaluation of test is based on the value of power load, wire diameter, type of conductive layer on the substrate, etc.
Keywords :
CMOS integrated circuits; integrated circuit interconnections; lead bonding; palladium compounds; silver compounds; AgPdPt; FR4 substrate; bonding power interconnection; ceramic substrate; conductive thick film layer; power application; power load; standard CMOS chips; wire diameter; Bonding; Contacts; Heating; Integrated circuit interconnections; Joints; Substrates; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Technology (ISSE), 2010 33rd International Spring Seminar on
Conference_Location :
Warsaw
Print_ISBN :
978-1-4244-7849-1
Electronic_ISBN :
978-1-4244-7850-7
Type :
conf
DOI :
10.1109/ISSE.2010.5547282
Filename :
5547282
Link To Document :
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