• DocumentCode
    3518372
  • Title

    Investigation of tin whiskers formation

  • Author

    Arazna, Aneta ; Koziol, Grazyna ; Steplewski, Wojciech

  • Author_Institution
    Centre of Adv. Technol., Tele & -Radio Res. Inst., Warsaw, Poland
  • fYear
    2010
  • fDate
    12-16 May 2010
  • Firstpage
    183
  • Lastpage
    185
  • Abstract
    After many studies and analysis the Tin Whisker Group of iNEMI recommended three tests to evaluate the whisker growth propensity of plating finishes: storage at ambient office condition, storage in climatic chamber and temperature cycling. In the paper results of investigation of whisker formation on the PWB immersion tin coatings as well as on the electroplated Sn on leads and terminations of components according these testes are presented. The tested immersion tin coatings of PWB were deposited from solution without additives which can minimize whisker formation and from solution with additives reducing tin whisker formation. Another investigated tin layer was deposited on copper which was ennobles and passivated by application of the ultra-thin layer (0.08 μm) of special organic compound. The results of the study indicate that whisker formation is a very long process and isothermal storage especially with high humidity is more effective in inducing whisker growth, than temperature cycle method.
  • Keywords
    electrodeposition; electroplated coatings; organic compounds; passivation; tin; whiskers (crystal); Cu; Sn; climatic chamber; coatings; electrodeposition; humidity; isothermal storage; organic compound; passivation; size 0.08 mum; tin whiskers formation; ultra-thin layer; whisker growth; Additives; Coatings; Corrosion; Humidity; Lead; Scanning electron microscopy; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Technology (ISSE), 2010 33rd International Spring Seminar on
  • Conference_Location
    Warsaw
  • Print_ISBN
    978-1-4244-7849-1
  • Electronic_ISBN
    978-1-4244-7850-7
  • Type

    conf

  • DOI
    10.1109/ISSE.2010.5547283
  • Filename
    5547283