• DocumentCode
    3518746
  • Title

    First principle study of the stability of H atoms in SiN layers on MONOS-type memories during program/erase operations

  • Author

    Yamaguchi, Keita ; Otake, Akira ; Kamiya, Katsumasa ; Shiraishi, Kenji ; Shigeta, Yasuteru

  • Author_Institution
    Grad. Sch. of Pure & Appl. Sci., Univ. of Tsukuba, Ibaraki, Japan
  • fYear
    2011
  • fDate
    8-10 Sept. 2011
  • Firstpage
    215
  • Lastpage
    218
  • Abstract
    Recently, hydrogen has been recognized as an important heteroatom in Metal-Oxide-Nitride-Oxide-Semiconductor (MONOS) -type memories for its quality improvement. However, if stability of H atoms in SiN layers changes by applying high voltage, memory characteristics of MONOS-type memories change during program/erase (P/E) operations, resulting in memory degradation. Therefore, in this paper, we have investigated the stability of H atoms in SiN charge trapping layers of MONOS-type memories during P/E operations by using first principles calculations. Our calculations show that H atoms in Si or N vacancies in SiN layers become unstable and migrate when high voltage is applied, leading to memory degradation with changes of memory characteristics. This result clearly indicates that suppression of H atoms in SiN layers is necessary for realization of high quality MONOS-type memories.
  • Keywords
    MOS memory circuits; ab initio calculations; hydrogen; nitrogen; silicon; silicon compounds; vacancies (crystal); H atom stability; MONOS-type memory; N vacancies; SiN; charge trapping layers; erase operation; first principle method; memory degradation; metal-oxide-nitride-oxide-semiconductor-type memory; program operation; Atomic layer deposition; Crystals; Degradation; Photonic band gap; Silicon; Silicon compounds; Stability analysis; MONOS; SiN; first principles calculations; non-volatile memory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
  • Conference_Location
    Osaka
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-61284-419-0
  • Type

    conf

  • DOI
    10.1109/SISPAD.2011.6034917
  • Filename
    6034917