Title :
Design considerations for industrial rear passivated solar cells
Author :
Lauermann, Thomas ; Fröhlich, Benjamin ; Hahn, Giso ; Terheiden, Barbara
Author_Institution :
Dept. of Phys., Univ. of Konstanz, Konstanz, Germany
Abstract :
In this work, the solar cell development issues arising by adding a dielectric rear side passivation to a standard screen-printing process are discussed with deposited Al2O3 on p-type Cz-Si as an example. The influence of several design parameters is assessed in simulation and experiment and an optimization strategy is presented. These parameters include optical properties of the cell, like the choice of dielectric layer thickness and wafer surface roughness, parameters that influence the passivation quality like the temperature of the co-firing step in a belt furnace as well as electrical parameters like contact geometry, contact spacing and base resistivity. Their influence on the three efficiency-determining quantities, VOC, JSC and FF is outlined. Special attention is paid to minimizing the inevitable loss in FF in a PERC design.
Keywords :
aluminium compounds; dielectric thin films; optimisation; silicon; solar cells; PERC design; base resistivity; contact geometry; contact spacing; dielectric layer thickness; dielectric rear side passivation; efficiency-determining quantities; electrical parameters; industrial rear passivated solar cells; optimization strategy; passivation quality; solar cell development; standard screen-printing process; wafer surface roughness; Conductivity; Firing; Passivation; Photovoltaic cells; Resistance; Silicon; dielectric films; finite element methods; photovoltaic cells; semiconductor device manufacture; silicon;
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
Conference_Location :
Austin, TX
Print_ISBN :
978-1-4673-0064-3
DOI :
10.1109/PVSC.2012.6317925