Title :
Excimer lasers for DUV lithography
Author_Institution :
Cymer Inc., San Diego, CA, USA
Abstract :
Summary form only given. The use of KrF and ArF excimer lasers as exposure sources for deep ultraviolet (DUV) lithography is discussed. Driven by extreme demands on performance, these lasers continually push the state-of-the-art in excimer laser design. Past, present, and future performance characteristics for these lasers are presented.
Keywords :
X-ray lithography; argon compounds; excimer lasers; krypton compounds; laser beam applications; photolithography; ArF; ArF excimer lasers; DUV lithography; KrF; KrF excimer lasers; deep ultraviolet lithography; excimer laser design; excimer lasers; exposure sources; performance characteristics; Atomic beams; Ionization; Laboratories; Laser modes; Laser theory; Lithography; Optical materials; Resists; Schrodinger equation; Tunneling;
Conference_Titel :
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-339-0
DOI :
10.1109/CLEO.1998.675948
