DocumentCode
3519581
Title
Deep ultraviolet steppers and scanners for sub-180-nm device fabrication
Author
Arnold, W.
Author_Institution
Lincoln Lab., MIT, Lexington, MA, USA
fYear
1998
fDate
3-8 May 1998
Firstpage
122
Abstract
Summary form only given. As minimum feature sizes for leading edge-logic and memory integrated circuits shrink to 180 nm and less, stepper manufacturers are pressed to develop optical systems of unprecedented performance and complexity. High-power, high-repetition-rate KrF and ArF excimer lasers are the ultraviolet light sources for these sophisticated optical tools.
Keywords
X-ray lithography; excimer lasers; integrated circuit technology; integrated memory circuits; laser beam applications; light sources; logic circuits; photolithography; 180 nm; ArF; KrF; X-ray lithography; deep ultraviolet scanners; deep ultraviolet steppers; high-power high-repetition-rate excimer lasers; leading edge-logic integrated circuits; memory integrated circuits; minimum feature sizes; optical systems; optical tools; photolithography; stepper manufacturers; sub-180-nm device fabrication; ultraviolet light sources; Atomic beams; Fabrication; Ionization; Laboratories; Laser modes; Laser theory; Lithography; Optical materials; Resists; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-339-0
Type
conf
DOI
10.1109/CLEO.1998.675949
Filename
675949
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