DocumentCode :
3520636
Title :
Schottky-barrier change by structural disorders at metal/Si interfaces: First-principles study
Author :
Kobinata, Kyosuke ; Nakayama, Takashi
Author_Institution :
Dept. of Phys., Chiba Univ., Chiba, Japan
fYear :
2011
fDate :
8-10 Sept. 2011
Firstpage :
295
Lastpage :
298
Abstract :
Schottky-barrier changes by structural disorders are studied using the first-principles calculation and adopting Au/Si interface. It is shown that the structural disorders prefer to locate near the interface, but the penetration depth of the MIGS into Si is about 5 Si layers similar to clean interface even when disorders exist Reflecting such penetration, Schottky barrier for holes shows little change in cases of Si vacancy and Au substitution, while it increases in cases of Si and Au interstitials due to the presence of Si dangling bonds.
Keywords :
Schottky barriers; ab initio calculations; dangling bonds; elemental semiconductors; gold; interstitials; semiconductor-metal boundaries; silicon; vacancies (crystal); Au-Si; MIGS; Schottky-barrier changes; dangling bonds; first-principle calculation; interstitials; metal induced gap state; metal-semiconductor interface; penetration depth; structural disorders; vacancy; Atomic layer deposition; Gold; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
Conference_Location :
Osaka
ISSN :
1946-1569
Print_ISBN :
978-1-61284-419-0
Type :
conf
DOI :
10.1109/SISPAD.2011.6035027
Filename :
6035027
Link To Document :
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