DocumentCode :
3521021
Title :
Fully analytic compact model of ballistic gate-all-around MOSFET with rectangular cross section
Author :
Numata, Tatsuhiro ; Uno, Shigeyasu ; Kamakura, Yoshinari ; Mori, Nobuya ; Nakazato, Kazuo
Author_Institution :
Dept. of Electr. & Comput. Sci., Nagoya Univ., Nagoya, Japan
fYear :
2011
fDate :
8-10 Sept. 2011
Firstpage :
39
Lastpage :
42
Abstract :
We develop a fully analytic compact model of gate-all-around metal-oxide-semiconductor field-effect transistors in the ballistic transport. The potential shape in the wire cross section is approximated by a parabolic function. With the model potential, electron energy levels are derived analytically and have an unknown parameter. The electron energy levels are determined by solving approximately the coupled equation of charge densities derived from quantum mechanics and electrostatics. We solve the coupled equation with the Aymerich approximation technique. The unknown parameter and also electron energy levels can be derived analytically. Device characteristics calculated from the analytic model are compared with the model with the unknown parameter obtained numerically, demonstrating an excellent accuracy. We carry out a circuit simulation with the analytic model of ballistic gate-all-around metal-oxide-semiconductor field-effect transistors.
Keywords :
MOSFET; approximation theory; ballistic transport; electrostatics; semiconductor device models; Aymerich approximation technique; ballistic gate-all-around MOSFET; ballistic gate-all-around metal-oxide-semiconductor field-effect transistors; ballistic transport; charge density equation; circuit simulation; electron energy levels; electrostatics; fully analytic compact model; parabolic function; quantum mechanics; rectangular cross section; Analytical models; Energy states; Integrated circuit modeling; Logic gates; Mathematical model; Numerical models; Wires; GAA-MOSFETs; analytic model; ballistic transport; circuit simulation; perturbation theory;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
Conference_Location :
Osaka
ISSN :
1946-1569
Print_ISBN :
978-1-61284-419-0
Type :
conf
DOI :
10.1109/SISPAD.2011.6035044
Filename :
6035044
Link To Document :
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