DocumentCode :
3521348
Title :
Integrated inductors on silicon and planarized ceramic substrates
Author :
Wang, Jianwei ; Cai, Jian ; Dou, Xinyu ; Wang, Shuidi
Author_Institution :
Nat. Lab. of Inf. Sci. & Technol., Tsinghua Univ., Beijing, China
fYear :
2009
fDate :
10-13 Aug. 2009
Firstpage :
504
Lastpage :
507
Abstract :
Passive integration is one of the important issues for system miniaturization in wireless applications on different substrate. Integrated inductors were designed and realized on both silicon and planarized ceramic substrate. Planarized ceramic substrate has the advantages such as lower cost than polished ceramic substrate and has other advantages such as lower dielectric constant, higher bulk resistance than silicon substrate. The L values of fabricated inductors on planarized ceramic substrate are about 1 nH, the peak values of Q are about 30 and the corresponding frequency is about 10 GHz. By contrast, for the Inductors fabricated on silicon substrate with the same process, the L values is more or less the same with those on ceramic substrate, the Q peak value is about 7 lower, the corresponding frequency is about 5 GHz.
Keywords :
ceramics; inductors; integrated circuits; radiocommunication; substrates; Si; integrated inductor; passive integration; planarized ceramic substrate; silicon substrate; wireless application; Capacitance; Ceramics; Circuits; Dielectric substrates; Frequency; Inductors; Rough surfaces; Silicon; Spirals; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Packaging Technology & High Density Packaging, 2009. ICEPT-HDP '09. International Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-4658-2
Electronic_ISBN :
978-1-4244-4659-9
Type :
conf
DOI :
10.1109/ICEPT.2009.5270699
Filename :
5270699
Link To Document :
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