DocumentCode
3521348
Title
Integrated inductors on silicon and planarized ceramic substrates
Author
Wang, Jianwei ; Cai, Jian ; Dou, Xinyu ; Wang, Shuidi
Author_Institution
Nat. Lab. of Inf. Sci. & Technol., Tsinghua Univ., Beijing, China
fYear
2009
fDate
10-13 Aug. 2009
Firstpage
504
Lastpage
507
Abstract
Passive integration is one of the important issues for system miniaturization in wireless applications on different substrate. Integrated inductors were designed and realized on both silicon and planarized ceramic substrate. Planarized ceramic substrate has the advantages such as lower cost than polished ceramic substrate and has other advantages such as lower dielectric constant, higher bulk resistance than silicon substrate. The L values of fabricated inductors on planarized ceramic substrate are about 1 nH, the peak values of Q are about 30 and the corresponding frequency is about 10 GHz. By contrast, for the Inductors fabricated on silicon substrate with the same process, the L values is more or less the same with those on ceramic substrate, the Q peak value is about 7 lower, the corresponding frequency is about 5 GHz.
Keywords
ceramics; inductors; integrated circuits; radiocommunication; substrates; Si; integrated inductor; passive integration; planarized ceramic substrate; silicon substrate; wireless application; Capacitance; Ceramics; Circuits; Dielectric substrates; Frequency; Inductors; Rough surfaces; Silicon; Spirals; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Packaging Technology & High Density Packaging, 2009. ICEPT-HDP '09. International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-4658-2
Electronic_ISBN
978-1-4244-4659-9
Type
conf
DOI
10.1109/ICEPT.2009.5270699
Filename
5270699
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