• DocumentCode
    3521348
  • Title

    Integrated inductors on silicon and planarized ceramic substrates

  • Author

    Wang, Jianwei ; Cai, Jian ; Dou, Xinyu ; Wang, Shuidi

  • Author_Institution
    Nat. Lab. of Inf. Sci. & Technol., Tsinghua Univ., Beijing, China
  • fYear
    2009
  • fDate
    10-13 Aug. 2009
  • Firstpage
    504
  • Lastpage
    507
  • Abstract
    Passive integration is one of the important issues for system miniaturization in wireless applications on different substrate. Integrated inductors were designed and realized on both silicon and planarized ceramic substrate. Planarized ceramic substrate has the advantages such as lower cost than polished ceramic substrate and has other advantages such as lower dielectric constant, higher bulk resistance than silicon substrate. The L values of fabricated inductors on planarized ceramic substrate are about 1 nH, the peak values of Q are about 30 and the corresponding frequency is about 10 GHz. By contrast, for the Inductors fabricated on silicon substrate with the same process, the L values is more or less the same with those on ceramic substrate, the Q peak value is about 7 lower, the corresponding frequency is about 5 GHz.
  • Keywords
    ceramics; inductors; integrated circuits; radiocommunication; substrates; Si; integrated inductor; passive integration; planarized ceramic substrate; silicon substrate; wireless application; Capacitance; Ceramics; Circuits; Dielectric substrates; Frequency; Inductors; Rough surfaces; Silicon; Spirals; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology & High Density Packaging, 2009. ICEPT-HDP '09. International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-4658-2
  • Electronic_ISBN
    978-1-4244-4659-9
  • Type

    conf

  • DOI
    10.1109/ICEPT.2009.5270699
  • Filename
    5270699